Narrowband coatings for the 100-105 nm range

Luis Rodríguez-de Marcos; José A. Méndez; Manuela Vidal-Dasilva; José A. Aznárez; Juan I. Larruquert


Observations in the far ultraviolet (FUV) at wavelengths in the ~100-105 nm range, which include 102.6 nm (H Lyman β), 103.2 and 103.8 nm (O VI lines), are expected to unveil fundamental information for solar physics and astrophysics. Often the intensity of those lines is weak, and they may be masked by more intense lines, such as H Lyman α at 121.6 nm for observations of the solar corona. Narrowband multilayers peaked in the ~100-105 nm have not been available because of the absorption of materials at these wavelengths along with a strong influence of contamination in this range. When efficient narrowband coatings are not possible, an option is the use of coatings with high reflectance at the target wavelength and simultaneously low reflectance at the undesired wavelength, such as 121.6 nm. High-reflective-narrowband coatings peaked at 100-105 nm have been developed. We have designed a four-layer system (Al/LiF/SiC/LiF) that results in a high H Lyman β-to-Lyman α reflectance ratio. Three samples with slightly different film thicknesses were prepared and measured in the 50-190 nm spectral range. All samples showed a promising reflectance ratio when fresh; however, some sample ageing was observed after months of storage in a desiccator, probably due to the effect of reaction with water vapor among other contaminants at the outermost layer (LiF). All samples retained a narrowband performance over time. The reflectance at 121.6 nm, which was very low on fresh samples, typically increased over time, although keeping a high 102.6-to-121.6-nm reflectance ratio. The same system results in an efficient narrowband coating peaked in the target spectral range. We measured a reflectance as high as 63% at the peak wavelength of 100.3 nm, at near-normal incidence, the highest experimental reflectance reported in this range for a narrowband coating.