GOLD’s main deposition system consists in a 75-cm diameter, 1-m tall vacuum chamber. This system is mainly devoted to thermal evaporation with hot-deposition capabilities. Deposition by Ion-beam-sputtering can be also performed, including multilayers alternating evaporation- with sputtering-deposited layers. The system is placed in an ISO-6 clean room.
Evaporation can be performed from 3 thermal sources.
Sputtering is performed with a 3-cm hollow-cathode ion gun. The target holder can accommodate four 100-mm diameter targets.
The stainless-steel chamber is evacuated with a cryopump and with oil-free forepumps.