Layer-by-layer design method for multilayers with barrier layers application to SiMo multilayers for extreme-ultraviolet lithography

Juan I. Larruquert Abstract A previous layer-by-layer multilayer design method [J. Opt. Soc. Am. A 19, 385 (2002)] is completed by adding the possibility of alternating layers with fixed thicknesses along with layers whose thicknesses are optimized for the largest...