por LARRUQUERT | Abr 29, 2000 | Coatings Design - Modified optical-constant models
A.S.Ferlauto, Joohyun Koh, P.I. Rovira, C.R. Wronski, R.W. Collins, Gautam Ganguly Abstract We describe simple expressions that use a minimum number of free parameters to fit the dielectric function spectra of a variety of Si-based film materials ranging from...
por LARRUQUERT | Abr 29, 2000 | articles-2000, OpticalConstans-non self-consistent methods
Juan I. Larruquert and Ritva A. M. Keski-Kuha Abstract Reflectance measurements and optical constants of thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr have been measured in the extreme-ultraviolet (EUV) spectral region from 49.0 to...
por Javier Renau López | Abr 29, 2000 | articles-2000
José A. Méndez, Juan I. Larruquert, and José A. Aznárez Abstract Thin films of C60 were investigated as protective coatings of Al films to preserve their far-UV (FUV) reflectance by inhibition or retardation of their oxidation. Two methods were used for the...
por LARRUQUERT | Abr 29, 2000 | articles-2000, OpticalConstans-non self-consistent methods
Juan I Larruquert, Ritva A. M. Keski-Kuha Abstract Reflectance measurements of ion-beam-deposited (IBD) C films were performed in the extreme ultraviolet (EUV) spectral region from 49 to 200 nm. Near normal incidence reflectance of IBD C films was determined to be...
por LARRUQUERT | Abr 29, 2000 | articles-2000, OpticalConstans-non self-consistent methods
Juan I. Larruquert and Ritva A. M. Keski-Kuha Abstract Hot-pressed B4C is found to have a high normal reflectance in the extreme-UV spectral region above 49 nm. This reflectance is comparable with or higher than chemical-vapor-deposited SiC in the spectral region from...
Comentarios recientes